What is the term used for the addition of suitable impurities into the semiconductor for modulating its properties?

The term used for the addition of suitable impurities into a semiconductor to modulate its properties is doping.

Doping is a deliberate process where impurities are introduced into a semiconductor material to change its electrical properties. There are two types of doping:

1. N-type doping: This involves adding elements like phosphorus or arsenic (which have more valence electrons than silicon) to the semiconductor material. These extra electrons are loosely bound and can move easily, creating an excess of negative charge carriers (electrons).

2. P-type doping: This involves adding elements like boron or gallium (which have fewer valence electrons than silicon) to the semiconductor material. These elements create “holes” in the semiconductor’s structure, which act as positive charge carriers.

Doping is essential in semiconductor manufacturing to create the necessary types of carriers (electrons and holes) for the operation of electronic devices such as diodes, transistors, and integrated circuits.